Kabushiki Kaisha Fujimi Incorporated

AQUAPAD

AQUA PAD;abrasive pads for polishing plastic lenses, glass lenses, metal, semiconductors and semiconductor devices and semi-conductor material for industrial, manufacturing and other commercial uses;

CERAPOLISH

CERAMICS POLISH;Polishing preparations for ceramics;

DIATEC

polish, namely, slurry type polish for metal processing and for texturing hard disks;

DISKLITE

Polishing composition for hard disks;DISK LITE, DISK LIGHT,;

F-TIP

Pigments; pigments for use in the manufacture of cosmetics; pigmented coatings used as paints;Chemicals for use in industry; titanium bis being hydrogen phosphate; chemicals for use in the manufacture of cosmetics; chemical additives for use in the manufacture of cosmetics; pigment dispersant for use in the manufacture of cosmetics; chemicals for use as conductors, namely, chemical compounds for conducting electricity or heat; chemicals for use as conductors, namely, electric and heat conductive chemical coatings for general industrial use; chemicals for use in the manufacture of lubricants; chemicals for the manufacture of pigments; chemicals for the manufacture of paints; chemicals for antibacterial preparations; chemicals for freshening preparations, namely, chemical additives used as sanitizers, disinfectants, preservatives, and antimicrobials in the manufacture of food, animal feed, chemical, medical, pharmaceutical, consumer, agribusiness products, textiles, building materials and wallpaper; chemicals for use in the manufacture of freshening preparations being air deodorizers; chemicals for use in the manufacture of filler preparations; chemicals for use in the manufacture of polymer coating agents; chemicals for use in the manufacture of optical reflectors; chemicals for reflectors in the nature of chemical additives for facilitating the reflection of light; chemicals for dispersing agents; chemicals in the nature of sorbents; chemicals for use in the manufacture of anti-rust preparations;

GLANZOX

Polishing composition for semi-conductors;

MIRAFLEX

Polishing pads for industrial polishing machines for use in polishing semiconductors, electronic circuits, hard discs, ceramics, sapphires, crystals, glasses, plastics, computer chips, metallic oxides and metallic materials during the manufacturing process;MIRA FLEX;Fixed abrasive grain, namely, abrasive rolls, abrasive sheets, abrasive strips, and abrasive disks;

MIRAFLEX

Polishing pads and buffing pads for power operated polishers and buffers; polishing pads for semiconductor wafer surface polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; polishing pads for use on glass, metal, fiberglass, rubber, wood, resin, ceramics and crystal;Polishing preparations; polishing preparations for industrial purposes; polishing, scouring and abrasive preparations; abrasive sand; industrial abrasives for use in manufacturing, shaping, and finishing glass, metal, fiberglass, rubber, wood, resin, ceramics and crystal; abrasive paste; polishing preparations in the nature of buffing and cutting compounds.; Polishing compounds for use on glass, metal, fiberglass, rubber, wood, resin, ceramics and crystal; scuffing pads; polishing slurries; cleaning preparations; cleaning and scouring preparations and compounds; car polish; tumbling media, namely, metal tumbling media used in polishing machines for polishing metal;

PLANERLITE

PLANER LIGHT;Polishing composition for semi-conductors;