OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLSLIMITED

ASTREA

Scientific and laboratory apparatus and instruments in the field of plasma technology and semiconductor processing, namely, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling all being laboratory apparatus and instruments; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, all being laboratory apparatus and instruments; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods;

AZTEC

Apparatus and instruments for microanalysis for non-medical purposes; namely, an x-ray detector, a pulse processor to characterize the x-ray energy, a MICS unit, namely a microscope image control system, for providing external scan control for the scanning electron microscope, and software for controlling the hardware; electron microscopes and microanalysis apparatus and instruments for non-medical purposes, namely, an x-ray detector, a pulse processor to characterize the x-ray energy, a MICS unit, namely a microscope image control system for providing external scan control for the scanning electron microscope, and software for controlling the hardware; x-ray microanalysis systems for non-medical purposes comprised of x-ray generating tubes, x-ray detectors, x-ray focusing devices, namely, x-ray mirrors, x-ray capillaries and x-ray optics; parts and fittings and controlling software for all of the aforesaid goods;

AZTEC

Apparatus and instruments for materials characterization and sample manipulation inside electron and ion-beam microscopes, namely, microanalysis X-ray detectors, and data acquisition and analytical software for Energy Dispersive Spectroscopy (EDS) and Wavelength Dispersive Spectroscopy (WDS), and detectors and data acquisition and analytical software for Electron Backscatter Diffraction (EBSD) analysis;

CAMEO

scientific instruments, namely, X-ray apparatus for non-medical microanalysis; instruments for analysis of chemical compositions; instruments for color analysis and color coding of samples; and computer software for use in operating X-ray apparatus for non-medical microanalysis;

COBRA

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods;Color is not claimed as a feature of the mark.;

CRYOFREE

SCIENTIFIC APPARATUS AND INSTRUMENTS, NAMELY, SUPERCONDUCTING MAGNETS, CRYOSTATS, AND REPLACEMENT PARTS AND FITTINGS THEREFOR;

INCA

X-RAY MICROANALYSIS SYSTEMS, CONSISTING OF INSTRUMENTS FOR DETECTING, MEASURING AND EVALUATING X-RAYS, ELECTRON IMAGES AND SIGNALS EMITTED AND PROJECTED BY SAMPLES WHEN STRUCK BY THE BEAM OF AN ELECTRON MICROSCOPE; PARTICLE ANALYZERS; SIGNAL PROCESSORS; RADIATION ANALYZERS; LIGHT ELEMENT DETECTORS; X-RAY ANALYZERS;

KELVINOX

IN THE STATEMENT, COLUMN 2, LINE 1, AFTER INSTITUTIONS, FOR THE PURPOSE OF COOLING SAMPLES OF MATERIAL OF 10MM OR LESS IN DIAMETER TO TEMPERATURES NEAR ABSOLUTE ZERO IS INSERTED.;DILUTION REFRIGERATOR UNITS OPERATING AT EXTREMELY LOW (MILLIKELVIN) TEMPERATURES FOR USE BY SCIENTIFIC RESEARCH INSTITUTIONS * FOR THE PURPOSE OF COOLING SAMPLES OF MATERIAL OF 10MM OR LESS IN DIAMETER TO TERMPERATURES NEAR ABSOLUTE ZERO *;

KELVINOX

Cryogenic apparatus and instruments for laboratory use, namely, ultra-low temperature refrigerators, dilution refrigerators, controllers for controlling the operation of the ultra-low temperature refrigerators and dilution refrigerators, sample and measurement probes for holding samples and taking measurements for experiments, chambers and chamber inserts, and replacement parts and fittings for the listed goods;KELVIN OXFORD;

LAYERPROBE

computer software for use with electron and ion-beam microscopes that uses the EDS (Energy Dispersive Spectroscopy) microanalysis technique to calculate the various film thicknesses and compositions that are present in a sample; computer software for measuring samples inside microscopes, including electron and ion-beam microscopes; computer software for processing X-ray data acquired from multi-layered samples inside an electron or ion-beam microscope to calculate the various film thicknesses and compositions that are present;LAYER PROBE;

OPAL

Apparatus for thin film deposition, including atomic layer deposition, namely, a reaction chamber, an energy source, means for introducing precursor and substrate chemical preparations into the reaction chamber, and sensors for measuring and monitoring deposition growth;Machines for manufacturing semiconductors;

PENTAFET

electronic apparatus and instruments; namely, signal processors, radiation analysers, light element detectors, x-ray analysers; and semi-conductor devices; and parts for all the aforesaid goods;

PINTAR

Scientific and laboratory apparatus and instruments namely, plasma sources, sources for generating plasma; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, plasma research apparatus and instruments, plasma cluster tools, all being laboratory apparatus and instruments; computer hardware and software for use with the aforesaid goods; parts and fittings for all the aforesaid goods;

PLASMALAB

PLASMA ETCHING AND DEPOSITION SYSTEMS, COMPRISING COMPUTERS, MICROPROCESSORS, AUTOMATIC CONTROLS, HIGH VACUUM CHAMBERS AND HIGH VACUUM PUMPING UNITS, ELECTRODES AND HIGH FREQUENCY PLASMA GENERATORS AND ASSOCIATED ANALYZERS USED IN THE MANUFACTURE OF INTEGRATED CIRCUITS, ELECTRONIC AND OPTICAL EQUIPMENT;PLASMA LABORATORY;

PLASMAPRO

Laboratory apparatus and instruments for the exchange of substances and heat with regard to plasma technology and semiconductor processing; laboratory robots for handling semiconductor wafers; tool measuring instruments, namely, plasma cluster tools and plasma processing research apparatus; computer hardware and software for operating the foregoing;PLASMA PRO;

POLARIS

Scientific and laboratory apparatus and instruments in the field of plasma technology and semiconductor processing, namely, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling all being laboratory apparatus and instruments; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, all being laboratory apparatus and instruments; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods;

SECO

Scientific and laboratory apparatus and instruments namely, plasma sources, sources for generating plasma; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, plasma research apparatus and instruments, plasma cluster tools, all being laboratory apparatus and instruments; computer hardware and software for use with the aforesaid goods; parts and fittings for all the aforesaid goods;

SEMEDX

X-RAY MICROANALYSIS SYSTEMS, CONSISTING OF X-RAY DETECTORS, COMPUTER HARDWARE AND COMPUTER SOFTWARE THEREFORE, FOR DETECTING, MEASURING AND EVALUATING X-RAYS, ELECTRON IMAGES AND SIGNALS EMITTED AND PROJECTED BY SAMPLES WHEN STRUCK BY THE BEAM OF AN ELECTRON MICROSCOPE, NOT FOR USE IN THE MEDICAL FIELD; PARTICLE ANALYZERS; SIGNAL PROCESSORS; RADIATION ANALYZERS; LIGHT ELEMENT DETECTORS; AND X-RAY ANALYZERS;

STRATUM

Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods;

SYMMETRY

Electron backscatter diffraction cameras; electron backscatter diffraction cameras used in relation to electron beam microscopes; electron backscatter diffraction cameras used in relation to ion beam microscopes; electron backscatter diffraction (EBSD) detectors for use in relation to electron microscopes; electron backscatter diffraction (EBSD) detectors for use in relation to ion beam microscopes;

ULTIM

Silicon drift detectors for X-ray analysis, not for medical use; silicon drift detectors for energy-dispersive X-ray spectroscopy, not for medical use; silicon drift detectors for wavelength dispersive X-ray spectroscopy, not for medical use;

VERICOLD

Cryogenic apparatus and instruments for laboratory use, namely, cryogenic detectors and cryostats for carrying out experiments, research and analysis for use in imaging and spectroscopy and for cooling quantum computers; structural parts and fittings for the aforesaid goods;VERY COLD;Laboratory equipment, namely, refrigerators, dilution refrigerators, pulse tube refrigerators, helium refrigerators, cryorefrigerator parts in the nature of cryogenic detectors and cryostats, and structural parts and fittings for all the aforesaid goods; refrigerators; dilution refrigerators; pulse tube refrigerators; helium refrigerators; cryorefrigerator parts in the nature of cryogenic detectors and cryostats; structural parts and fittings for all the aforesaid goods;