SILTRONIC AG

ADVARA

Doped and undoped, polycrystalline and monocrystalline inorganic semiconductor material, particularly in the form of rods, tubes, sheets (wafers) and moulded bodies, in sawed, lapped, polished, etched and coated form; substrates coated with semiconductor material in the form of moulded bodies;CHEMICALS FOR USE IN THE CHEMICAL, ENGINEERING, ELECTRONICS, ELECTRICAL, SEMICONDUCTOR, MICROCHIP AND TERRESTRIAL PHOTOVOLTAIC INDUSTRIES; INORGANIC ELEMENTS AND COMPOUNDS IN THE FORM OF HYPERPURE CRYSTALS FOR USE IN THE CHEMICAL, ENGINEERING, ELECTRONICS, ELECTRICAL, SEMICONDUCTOR, MICROCHIP AND TERRESTRIAL PHOTOVOLTAIC INDUSTRIES; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF CRYSTALS, GRANULES AND POWDERS, IN SAWED, LAPPED, POLISHED, ETCHED AND COTED FORM; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF RODS, TUBES, WAFERS AND MOULDED BODIES, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; SUBSTRATES COATED WITH SEMICONDUCTOR MATERIAL IN THE FORM OF WAFERS, RODS, TUBES, GRANULES AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; HYPERPURE SILICON FOR THE ELECTRICAL AND ELECTRONIC INDUSTRIES; MONOCRYSTALLINE SILICON IN THE FORM OF RODS, BLOCKS, WAFERS IN THE POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS;

ADVARON

DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF CRYSTALS, GRANULES AND POWDERS, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF RODS, TUBES, WAFERS AND MOULDED BODIES, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; SUBSTRATES COATED WITH SEMICONDUCTOR MATERIAL IN THE FORM OF WAFERS, RODS, TUBES, GRANULES, MOULDED BODIES AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; HYPERPURE SILICON SOLD IN SLICES FOR USE IN THE ELECTRICAL AND ELECTRONIC INDUSTRIES; MONOCRYSTALLINE SILICON IN THE FORM OF RODS, BLOCKS, WAFERS AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS;

AVANTOX

Doped and undoped, polycrystalline and monocrystalline inorganic semiconductor material in the form of rods, tubes, wafers and moulded bodies, in sawed, lapped, polished, etched and coated form; substrates coated with semiconductor material in the form of moulded bodies;Chemical for used in the chemical, engineering, electronics, electrical, semiconductor, microchip and terrestrial photovoltaic industries; inorganic elements and compounds in form of hyperpure crystals for use in the chemical, engineering, electronics, electrical, semiconductor, microship and terrestrial photovoltaic industries; doped and undoped polycrystalline and monocrystalline inorganic semiconductor material in the form of crystals, granules and powders, in sawed, lapped, polished, etched and coated form; substrates coated with semiconductor material in the form of wafers, rods, tubes, granules and powders for use in the manufacture of semiconductors; hyperpure silicon for the electrical and electronic industries; monocrystalline silicon in the form of rods, blocks, wafers and powders for use in the manufacture of semiconductors;

HIREF

[ SILICON WAFERS; ORGANIC SEMICONDUCTORS FOR USE IN THE ELECTRICAL AND ELECTRONIC INDUSTRIES; HYPERPURE SILICON SOLD IN THE FORM OF WAFERS FOR USE IN THE ELECTRICAL AND ELECTRONIC INDUSTRIES ];[ INORGANIC ELEMENTS AND COMPOUNDS IN THE FORM OF HYPERPURE CRYSTALS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS IN THE ELECTRICAL AND ELECTRONICS INDUSTRY; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF CRYSTALS, GRANULES AND POWDERS, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF RODS, TUBES, WAFERS AND MOULDED BODIES, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; SUBSTRATES COATED WITH SEMICONDUCTOR MATERIAL IN THE FORM OF WAFERS, RODS, TUBES, GRANULES AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; SUBSTRATES COATED WITH SEMICONDUCTOR MATERIAL IN THE FORM OF MOULDED BODIES FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; MONOCRYSTALLINE SILICON IN THE FORM OF RODS, BLOCKS, WAFERS AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; POLYCRYSTALLINE SILICON IN THE FORM OF POWDERS, GRANULES, BLOCKS, SHEETS AND MOULDED BODIES FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS ];

HIREF

SILICON WAFERS; ORGANIC SEMICONDUCTORS FOR USE IN THE ELECTRICAL AND ELECTRONIC INDUSTRIES; HYPERPURE SILICON SOLD IN THE FORM OF WAFERS FOR USE IN THE ELECTRICAL AND ELECTRONIC INDUSTRIES;INORGANIC ELEMENTS AND COMPOUNDS IN THE FORM OF HYPERPURE CRYSTALS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS IN THE ELECTRICAL AND ELECTRONICS INDUSTRY; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF CRYSTALS, GRANULES AND POWDERS, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; DOPED AND UNDOPED POLYCRYSTALLINE AND MONOCRYSTALLINE INORGANIC SEMICONDUCTOR MATERIAL IN THE FORM OF RODS, TUBES, WAFERS AND MOULDED BODIES, IN SAWED, LAPPED, POLISHED, ETCHED AND COATED FORM; SUBSTRATES COATED WITH SEMICONDUCTOR MATERIAL IN THE FORM OF WAFERS, RODS, TUBES, GRANULES AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; SUBSTRATES COATED WITH SEMICONDUCTOR MATERIAL IN THE FORM OF MOULDED BODIES FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; MONOCRYSTALLINE SILICON IN THE FORM OF RODS, BLOCKS, WAFERS AND POWDERS FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS; POLYCRYSTALLINE SILICON IN THE FORM OF POWDERS, GRANULES, BLOCKS, SHEETS AND MOULDED BODIES FOR USE IN THE MANUFACTURE OF SEMICONDUCTORS;

HIREF

Silicon wafers; hyperpure silicon sold in the form of wafers for use in the electrical and electronic industries;Doped and undoped monocrystalline silicon in the form of wafers for use in the manufacture of semiconductors; doped and undoped monocrystalline silicon wafers in sawed, lapped, polished, etched and coated form for use in the manufacture of semiconductors; monocrystalline silicon wafers for use in the manufacture of semiconductors;

POWERFZ

monocrystalline silicon wafers; moulded semiconductor substrates; and doped and undoped inorganic semiconductor material in the form of rods, tubes, wafers and moulded bodies in sawed, lapped, polished, etched and coated form;POWER FZ;inorganic elements and compounds for use in the chemical, engineering, electronics, electrical, semi-conductor, microchip and terrestrial photovoltaic industries; hyperpure silicon and silicon for use in the electrical and electronic industries; doped and undoped inorganic semi-conductor material in the form of crystals, granules and powders in sawed, lapped, polished, etched and coated form for use in electrical and electronic, semi-conductor and microchip industries;

SILTRONIC

[ Organic semiconductors; ] polycrystalline and monocrystalline inorganic semiconductors; moulded semiconductor substrates;Color is not claimed as a feature of the mark.;Chemical products used in industry, science, [ photography, agriculture, horticulture and forestry, ] namely, [ silanes, hydrochloric acid, ] silicon, [ chemical slurries for polishing semiconductors, chemical source material for the deposition of thin films upon semiconductors, and gallium-gadolinium garnet; ] conductive and semiconductive, [ doped and undoped organic polymers for use in manufacturing conductors and semiconductors; ] inorganic elements and compounds in form of hyperpure crystals used in the electrical, electronic, and microelectronic industries; doped and undoped, polycrystalline and monocrystalline inorganic semiconductor material, particularly in the form of crystals, granules and powders, in sawed, lapped, polished, etched and coated form used in the manufacture of semiconductors; doped and undoped, polycrystalline and monocrystalline inorganic semiconductor material, particularly in the form of rods, tubes, sheets, wafers, and moulded bodies, in sawed, lapped, polished, etched and coated form for use in electrical, electronic, and microelectronic industries; substrates coated with semiconductor material in the form of moulded bodies, sheets, wafers, rods, tubes, granules and powders for use in electrical, electronic, and microelectronic industries; hyperpure silicon for the electrical and electronic industries; monocrystalline silicon in the form of rods, blocks, sheets, wafers, and powders; polycrystalline silicon in the form of powders and granules; polycrystalline silicon in the form of blocks, sheets and moulded bodies included in this class;

SMARTFZ

Semiconductor materials for manufacturing integrated circuits, electronic devices and electronic memories, and photovoltaic purposes, namely, silicon wafers;SMART FZ;Inorganic chemical compounds, namely, semiconductor crystals; inorganic chemical compounds in the form of semiconductor single crystal ingots and semiconductor single crystal wafers; non-metallic silicon in the form of silicon single crystal ingots and silicon single crystal wafers; silicon in the nature of granular silicon;

SMARTFZ

Semiconductors for the manufacture of electronic circuits and components, electronic memories and for photovoltaic purposes; Semiconductors in the form of crystal blocks and wafers; Silicon wafers (for integrated circuits); semiconductor materials for manufacturing integrated circuits, electronic devices and electronic memories, and photovoltaic purposes, namely, silicon wafers;SMART FZ;Silicon in the form of monocrystalline ingots and monocrystalline wafers; Silicon with granular form; Inorganic chemical compounds, namely, semiconductor crystals; inorganic chemical compounds in the form of semiconductor single crystal ingots and semiconductor single crystal wafers; non-metallic silicon in the form of silicon single crystal ingots and silicon single crystal wafers; silicon in the nature of granular silicon;

WACKER SILTRONIC

Semiconductors and semiconductor material, namely, crystalline silicon and silicon chips in the form of blocks, sheets, wafers, rods, granules, powders and moulded bodies, hyperpure silicon wafers and chips for use in the electrical, electronic and microelectronic industries; semiconductor material, namely, monocrystalline silicon in the form of rods, blocks, sheets, wafers, and powders, and semiconductor devices;In the statement, Column 1, line 10, before electrical, the should be inserted.;Chemicals, namely, silanes, hydrochloric acid, silicon, and gallium-gadolinium garnet for use in * the * electrical, electronic and microelectronic industries; doped and undoped organic polymers for use in manufacturing conductors and semiconductors; inorganic compounds in the form of hyperpure crystals used in the electrical, electronic and microelectronic industries; doped and undoped polycrystalline and monocrystalline inorganic compounds in the form of crystals, granules, and powders in sawed, lapped, polished, etched and coated form used in the manufacture of semiconductors; doped and undoped polycrystalline and monocrystalline inorganic compounds in the form of rods, tubes, sheets, wafers and moulded bodies, in sawed, lapped, polished, etched and coated form for use in electrical, electronic and microelectronic industries;

WASO

Semiconductor Base Material;