Testbourne Limited

SUPERVAC

Common metals and their alloys sold in product form, namely, foils, sheets, discs, granules, ingots, pellets, pieces, shot, powder, rods, cones, bars, tablets and cubes; [ non-electric cables and wires of common metal; ] foils of common metal and of alloys thereof, sheets of common metal and alloys thereof, ingots of common metal and alloys thereof, common metal and alloys thereof in the form of shot, powder of common metal and alloys thereof, sputtering targets of common metal and alloys thereof; wires of common metal and alloys thereof; crucibles of common metal and alloys thereof; [ restrictively heated evaporation sources made from high purity refractory metals; ] Discs of common metal and alloys thereof, granules of common metal and alloys thereof, pellets of common metal and of alloys thereof, rods of common metal and alloys thereof, cones of common metal and alloys thereof, bars of common metal and alloys thereof, tablets of common metal and alloys thereof, cubes of common metal and alloys thereof, all for use in further manufacture;SUPER VACUUM;Color is not claimed as a feature of the mark.;

SUPERVAC

INDUSTRIAL OILS; INDUSTRIAL GREASES; INDUSTRIAL LUBRICANTS; DUST ABSORBING, WETTING AND BINDING COMPOSITIONS FOR INDUSTRIAL USE; FUEL OILS; AND MOTOR SPIRITS;SUPER VACUUM;

SUPERVAC

SUPER VACUUM;Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, cesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafnium, holmium, indium, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, osmium, palladium, phosphorous, platinum, praseodymium, rhenium, rhodium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, sulphur, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc, zirconium, borides, carbides, fluorides, nitrides, oxides, silicides, selenides, sulphides, tellurides, ammonium compounds, alloys, metal alloys, compounds of aluminum, antimony, arsenic, barium, beryllium, bismuth, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafniurn, holmium, indium, iodine, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, mercury, molybdenum, neodymium, nickel, niobium, palladium, phosphorous, platinum, potassium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium, polymers for use as sputtering targets, acrylonitrile butadiene styrene, chlorinated polyvinyl chloride, chlorotrifluoro-ethylene, polyethylene, polyetheretherketone, polyethylene teraphthalate, polyethylene teraphthalate modified with cyclohexane dimethanol, polyvinyl chloride, polyvinylidene fluoride, polytetrafluoroethylene and polyamide, silicon monoxide, filaments of tungsten; photographic chemicals; fluids for hydraulic circuits and vacuum pumps; fluids for use with abrasives used in the scientific examination of samples by electron-microscopy, laboratory analysis processes, precision cutting, grinding and polishing of metallics, glasses and ceramic components used in the aerospace, automotive, capacitor, electrical resistor and electro-optical, electro-medical, magnetic, micro-electronic, optical and sensor industries; high vacuum fluids for use in pumps specific to the high vacuum industry, namely, mechanical and vapor diffusion pumps; high purity chemicals for use in thin vapor deposition CVD in atmospheric pressure, high vacuum and ultra vacuum processing applications for the manufacture of computers, microprocessors, flat bed display screens, magnetic recording heads, semi-conductor devices and super-conductive devices, electrical components, namely, resistors, capacitors, and cathode-ray tubes, vacuum distillation and freeze drying of foodstuffs, metallurgy, pharmaceutical, and optical industries; adhesives used in manufacturing, namely, high vacuum adhesives and ultra-high vacuum sealing adhesives, low-temperature waxes for mounting optical components during polishing processes, and silver epoxy resins for bonding sputtering targets to sputtering sources;

TESTBOURNE

Scientific instruments, namely, sputter coaters, ion beam etchers for production of semiconductors; digital measuring devices namely, orientation sensors; equipment for preparing specimens for electron microscopy, namely, ultrasonic cutters, precision dimpling instruments, electro-polishers, disk cutters and mechanical pre-thinning instruments; cathode ray tubes; electrical conductors; electrical connectors; laboratory crucibles; vacuum pressure gauges; thin film thickness monitors; thin-film thickness controllers; thin film sensor heads; coaxial cables; thermocouples; d-type electrical connectors; high voltage electric plugs; laboratory equipment, namely, crucibles of metal and metal alloy; pressure flow controls and vacuum process controllers;TEST BOURNE;

TESTBOURNE

Machines utilizing high-vacuum technology, namely, machines for depositing very thin films of materials, machines for producing sources of high vacuum, machines for impregnating electrical components and machines for effecting molecular beam epitaxy; sputter coating machines; machines for etching or removing organics from specimens; machines for preparing samples for chemical and physical analysis with low-temperature plasma oxidation; cluster flanges; machines containing thermal evaporation sources, sputtering sources, substrate heaters, ion sources, dies of graphite or metal, crucibles, and manipulators; couplings for machines; transmissions for machines other than land vehicles; vacuum pumps for machines; replacement parts for the aforesaid goods;TEST BOURNE;

TESTBOURNE

Sputtering targets of common metal and alloys thereof; common metals and their alloys for further manufacture; metal cable wires and wires of common metal; common metal and alloys thereof in the form of foils, sheets, discs, granules, ingots, pellets, pieces, shot, powder, rods, cones, bars, tablets and cubes for further manufacture; wires of common metal and alloys thereof; aluminium, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, hafniurn, holmium, indium, iodine, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium; common metals and their alloys for use in the deposition of thin films;TEST BOURNE;

TESTBOURNE

Industrial oils; industrial greases; industrial lubricants; dust absorbing, wetting and binding compositions for industrial use; fuel oils; and motor spirits;TEST BOURNE;

TESTBOURNE

TEST BOURNE;Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, cesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafnium, holmium, indium, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, osmium, palladium, phosphorous, platinum, praseodymium, rhenium, rhodium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, sulphur, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc, zirconium, borides, carbides, fluorides, nitrides, oxides, silicides, selenides, sulphides, tellurides, ammonium compounds, alloys, metal alloys, compounds of aluminum, antimony, arsenic, barium, beryllium, bismuth, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafniurn, holmium, indium, iodine, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, mercury, molybdenum, neodymium, nickel, niobium, palladium, phosphorous, platinum, potassium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium, polymers for use as sputtering targets, acrylonitrile butadiene styrene, chlorinated polyvinyl chloride, chlorotrifluoro-ethylene, polyethylene, polyetheretherketone, polyethylene teraphthalate, polyethylene teraphthalate modified with cyclohexane dimethanol, polyvinyl chloride, polyvinylidene fluoride, polytetrafluoroethylene and polyamide, silicon monoxide, filaments of tungsten;[ photographic chemicals; fluids for hydraulic circuits and vacuum pumps; fluids for use with abrasives used in the scientific examination of samples by electron-microscopy, laboratory analysis processes, precision cutting, grinding and polishing of metallics, glasses and ceramic components used in the aerospace, automotive, capacitor, electrical resistor and electro-optical, electro-medical, magnetic, micro-electronic, optical and sensor industries; high vacuum fluids for use in pumps specific to the high vacuum industry, namely, mechanical and vapor diffusion pumps;] high purity chemicals for use in thin vapor deposition CVD in atmospheric pressure, high vacuum and ultra vacuum processing applications for the manufacture of computers, microprocessors, flat bed display screens, magnetic recording heads, semi-conductor devices and super-conductive devices, electrical components, namely, resistors, capacitors, and cathode-ray tubes, vacuum distillation and freeze drying of foodstuffs, metallurgy, pharmaceutical, and optical industries; adhesives used in manufacturing, namely, high vacuum adhesives and ultra-high vacuum sealing adhesives, low-temperature waxes for mounting optical components during polishing processes, and silver epoxy resins for bonding sputtering targets to sputtering sources;