POLARIS

Welcome to the Brand page for “POLARIS”, which is offered here for Scientific and laboratory apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling all being laboratory apparatus and instruments; plasma research apparatus and instruments, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, all being laboratory apparatus and instruments; plasma cluster tools, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods;.

Its status is currently believed to be active. Its class is unavailable. “POLARIS” is believed to be currently owned by “OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLSLIMITED”.


Owner:
OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLSLIMITED
Owner Details
Description:
Scientific and laboratory apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling all being laboratory apparatus and instruments; plasma research apparatus and instruments, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, all being laboratory apparatus and instruments; plasma cluster tools, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods;
Categories: SCIENTIFIC LABORATORY APPARATUS