ATOMIC LAYER DEPOSITION SYSTEMS COMPRISED

Brand	Owner (click to sort)	Address	Description
FIREBIRD	VEECO INSTRUMENTS INC.	1 Terminal Drive Plainview NY 11803	Atomic layer deposition systems comprised of a reaction chamber, a wafer handler, electronic control circuitry and electronic components therefor, all sold as a unit, for use in applying atomic layer coatings on various surfaces;
MEDALD	ULTRATECH, INC.	3050 Zanker Road San Jose CA 95134	atomic layer deposition systems comprised of a reaction chamber, precursor lines and a cabinet, all sold as a unit for performing atomic deposition layering for use in applying atomic layer coatings on various surfaces or for use as combined with a semiconductor wafer processing machine as a dual purpose unit;MED ALD;
SMARTMEDALD	ULTRATECH, INC.	3050 Zanker Road San Jose CA 95134	atomic layer deposition systems comprised of a reaction chamber, precursor lines and a cabinet, all sold as a unit for performing atomic deposition layering for use in applying atomic layer coatings on various surfaces or for use as combined with a semiconductor wafer processing machine as a dual purpose unit;SMART MED ALD;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

An atomic layer deposition method for forming a microelectronic layer employs a reactor chamber pressure of greater than about 500 mtorr and more preferably from about 20 to about 50 torr. By employing a reactor chamber pressure within the foregoing range, the microelectronic layer is formed with an enhanced deposition rate while employing the atomic layer deposition method, due to a gas phase chemical vapor deposition component to the atomic layer deposition method.