VEECO INSTRUMENTS INC.

ALTAIR

lithography equipment for advanced packaging of integrated circuits;

APEX

Gas mixers specially adapted for installation in CVD (chemical vapor deposition) and MOCVD (metal organic chemical vapor deposition) process machines for use in thin film manufacture for semiconductor device, LED, electronics, solar cell, microelectromechanical, and optical applications;

ARIS

Electronic equipment and apparatus for ion beam processing;

ATLAS

software to optimize stepper performance for the production of semiconductor chips, and parts and materials therefore;

BLUTEMP

Pyrometers;BLUE TEMP;

BRITECARRIER

Semiconductor wafer holders;BRIGHT CARRIER;

CAMBRIDGE NANOTECH

semiconductor wafer processing machines; semiconductor wafer processing machines for thin film deposition systems; semiconductor wafer processing machines for atomic layer deposition systems;

CASCADE ETCH

Wafer handling platform for precision surface processing (PSP) systems for semiconductor fabrication equipment, namely, wafer handling arms, wafer handling components, namely, wafer chucks and end-effectors, industrial robots and operating software sold as an integral component thereof, wafer aligners and wafer handling industrial robots for use in the field of semiconductor fabrication;ETCH;

CASCADE EZ LIFT

Chamber hardware for precision surface processing (PSP) systems for semiconductor wafers comprised of immersion tanks, high-pressure spray chambers, and electronically controlled mechanical components in the nature of gas mixing and injection components, wafer handling components, and high-pressure flow monitoring components for incorporation into semiconductor fabrication machinery;CASCADE EASY LIFT;LIFT;

CASCADE SOLVENT

Chamber hardware for precision surface processing (PSP) systems for semiconductor wafers comprised of wafer handling platform for precision surface processing (PSP) systems for semiconductor fabrication equipment, namely, wafer handling arms, wafer handling components, namely, wafer chucks and end-effectors, industrial robots and operating software sold as an integral component thereof, wafer aligners and wafer handling industrial robots for use in the field of semiconductor fabrication;SOLVENT;

DEKTAK

surface measurement instrumentation, namely stylus based surface profilers, four-point resistivity probes, atomic force profilers, and atomic force microscopes;

DIGITAL INSTRUMENTS

SCIENTIFIC AND TECHNOLOGICAL RESEARCH AND DEVELOPMENT OF PRODUCTS FOR OTHERS, NAMELY ATOMIC FORCE MICROSCOPES AND SCANNING TUNNELING MICROSCOPES, IN THE FIELD OF METROLOGY;

DISCOVERY

MACHINES FOR PRODUCING COMPOUND SEMICONDUCTOR MATERIALS;

ENTERPRISE

REACTORS FOR PRODUCING COMPOUND SEMICONDUCTOR MATERIALS;

EPIK 700

Metal organic chemical vapor deposition (MOCVD) machines;EPIC SEVEN HUNDRED;

EPIVIEW

COMPUTER SOFTWARE FOR CONTROLLING EPITAXIAL REACTORS;EPI VIEW;

ETHERION

Wafer handling platform for semiconductor fabrication equipment, namely, wafer handling arms, wafer handling components, namely, wafer chucks and end-effectors, industrial robots and operating software sold as an integral component thereof, wafer aligners and wafer handling industrial robots for use in the field of semiconductor fabrication;

FAST

Thin film deposition systems for semiconductor fabrication equipment/machines;

FASTFLEX

Web coating machines for thin film solar products, parts for the aforementioned machines, particularly, nozzles, application units sold to manufacturers of solar panels; machinery for depositing materials on substrates;FAST FLEX;

FASTLINE

Machinery for depositing materials on substrates;FAST LINE;

FIJI

183 Atomic layer deposition systems for a variety of coating applications, namely, gate dielectrics, gate electrodes, metal interconnects, diffusion barriers, DRAM, multilayer-capacitors, read heads, antireflection, optical filters, OLED layers, photonic crystals, transparent conductors, electroluminescence, solar cells, lasers, integrated optics, MEMS, etch resistance, hydrophobic / antistiction, blade edges, molds and dies, solid lubricants, anti corrosion, inside pores, nanotubes, around particles AFM tips, chemicals, catalysis, fuel cells, roll to roll, internal tube liners, nano-glue, biocompatible, and magnetics, among others; semiconductor wafer processing machines; deposition systems comprised in part of a reaction chamber, precursor lines, and a cabinet for coating;

FIREBIRD

Atomic layer deposition systems comprised of a reaction chamber, a wafer handler, electronic control circuitry and electronic components therefor, all sold as a unit, for use in applying atomic layer coatings on various surfaces;

FLOWFLANGE

gas distribution system comprised of system dependent vacuum components and other machined components, namely, swagelock fittings, viewports, gaskets, injector weldment plates, injector plates, screens, adjustable viewport tubes, screen and viewport spacers, injector rings, and weldment flanges, sold as a unit, for producing compound semiconductors;FLOW FLANGE;

FLOWFLANGE

Metal organic vapor phase deposition system, namely, a gas distribution system used in the manufacture of semiconductor devices, comprised of system-dependent vacuum components, namely, pumps, and other machined components, namely, tube fittings, viewports, gaskets, injector plates, adjustable viewport tubes, screen and viewport spacers, injector rings, and weldment flanges; all of the aforementioned sold as a unit;

GENXPLOR

Molecular beam epitaxy systems, namely, machinery for growing epitaxial layers on substrates, and component parts therefor;

GUARDIAN MULTIFILTER

components for precision surface processing (PSP) system for semiconductor wafers, namely, PSP system filters;MULTI FILTER;

IMMJET

Semiconductor wafer processing equipment;

ISOFLANGE700

Apparatus for dispensing material sold as a component part of Metal Organic Chemical Vapor Deposition (MOCVD) equipment;ISO FLANGE 700;

ISOTEMP

Calibration instruments for process equipment, namely, measurement instruments for chemical vapor deposition equipment;

LIGHTING YOUR WAY

Wholesale and retail sales of equipment and products to the optical telecommunications market;

LUMINA

deposition systems for the production of LED lights, advanced LED lights, and photonics applications comprised of wafer handlers, gas delivery equipment, reaction chambers;

MAKING A MATERIAL DIFFERENCE

Scientific machines and apparatus, namely, physical, chemical and electro technical equipment, and parts therefore, diamond like carbon systems, ion beam deposition systems and ion beam sources therefore, ion beam etch systems, physical vapor deposition systems, lapping/dicing systems, thermal deposition sources; semiconductor fabrication machines and magnetic storage fabrication machines including components therefore; scientific machines and apparatus, namely, molecular beam epitaxy (MBE) systems including components therefore and metal organic chemical vapor deposition (MOCVD) systems including wafer carriers and components therefore, wafer processing machines including components therefore; laser annealing systems comprised of lasers for annealing purposes including components therefore; photolithographic machines for manufacturing semiconductor wafers and other substrates including components therefore; semiconductor wafer processing machines for atomic layer deposition systems including components therefore; semiconductor wafer processing equipment; semiconductor single wafer processing machines using etch chemicals for the semiconductor industry; semiconductor single wafer wet processing machines using solvent chemicals; gas sensors and controls for regulating gas concentrations and/or mass transfer rates in various manufacturing processes; machines containing ion sources and ion source controllers for vacuum coating processes; molecular beam epitaxy crucibles and effusion cells for manufacturing semi-conductors and integrated circuits; computer control software for use in ion beam system applications through touch screen mode; heated high speed rotating disks operated under high vacuum and exposed to the flow of chemicals in the production of semiconductors; optical coating ion beam machine for coating multi-layer optical thin films including components therefore;Manufacturing machines and apparatus, namely, physical, chemical and electro technical equipment, and parts therefore, diamond like carbon systems, ion beam deposition systems and ion beam sources therefore, ion beam etch systems, physical vapor deposition systems, lapping/dicing systems, thermal deposition sources; semiconductor fabrication machines and magnetic storage fabrication machines including components therefore; manufacturing machines and apparatus, namely, molecular beam epitaxy (MBE) systems including components therefore and metal organic chemical vapor deposition (MOCVD) systems including wafer carriers and components therefore, wafer processing machines including components therefore; laser annealing systems comprised of lasers for annealing purposes including components therefore; photolithographic machines for manufacturing semiconductor wafers and other substrates including components therefore; semiconductor wafer processing machines for atomic layer deposition systems including components therefore; semiconductor wafer processing equipment; semiconductor single wafer processing machines using etch chemicals for the semiconductor industry; semiconductor single wafer wet processing machines using solvent chemicals; gas sensors and controls for regulating gas concentrations and/or mass transfer rates in various manufacturing processes; machines containing ion sources and ion source controllers for vacuum coating processes; molecular beam epitaxy crucibles and effusion cells for manufacturing semi-conductors and integrated circuits; computer control software for use in ion beam system applications through touch screen mode; heated high speed rotating disks operated under high vacuum and exposed to the flow of chemicals in the production of semiconductors; optical coating ion beam machine for coating multi-layer optical thin films including components therefore;

MARK

Machines containing ion sources and ion source controllers for vacuum coating processes;

MAXBRIGHT

chemical vapor deposition tools, namely, wafer process machines;MAX BRIGHT;

MICROETCH

electrical & scientific apparatus; namely, machines for the production of semiconductors such as ion beam etching and deposition;IN THE STATEMENT, COLUMN, 1, LINE 1, NEW YORK CORPORATION SHOULD BE DELETED AND DELAWARE CORPORATION SHOULD BE INSERTED.;MICRO-ETCH;

MIDAS

deposition equipment used in the optoelectronics industry, composed of vacuum chambers;

NANOTECH

Stepper and lithography machines for use in the production of semiconductors and manuals therefore sold as a unit;

NEXUS

Equipment for the production of semiconductors, namely, ion beam etching and deposition machines;

NOVUS

Machinery and parts therefor for applying vacuum coatings on substrates using ion sources;

OPTIUM

Machines for the production and manufacturing of semiconductors;

PHOENIX

Atomic layer deposition systems for a variety of coating applications, namely, gate dielectrics, gate electrodes, metal interconnects, diffusion barriers, DRAM, multilayer-capacitors, read heads, antireflection, optical filters, OLED layers, photonic crystals, transparent conductors, electroluminescence, solar cells, lasers, integrated optics, MEMS, etch resistance, hydrophobic / antistiction, blade edges, molds and dies, solid lubricants, anti corrosion, inside pores, nanotubes, around particles AFM tips, chemicals, catalysis, fuel cells, roll to roll, internal tube liners, nano-glue, biocompatible, and magnetics, among others; semiconductor wafer processing machines; deposition systems comprised in part of a reaction chamber, precursor lines, and a cabinet for coating;

PICOANGLER

handheld tool used to explore tip-sample interactions manually, relative to force spectroscopy research;

PMMAX

Filters for industrial chemical reactors used in thin film deposition equipment;

PROPEL

Process equipment, namely, Metal Organic Chemical Vapor Deposition (MOCVD) equipment;

QUEST

Optical monitoring devices for monitoring properties of coatings for use in thin film production;

SATURN WAFER STEPPER

photolithography tool for imprinting integrated circuit designs on silicon wafers;WAFER STEPPER;

SAVANNAH

Atomic layer deposition machines for a variety of coating applications, namely, gate dielectrics, gate electrodes, metal interconnects, diffusion barriers, DRAM, multilayer-capacitors, read heads, antireflection, optical filters, OLED layers, photonic crystals, transparent conductors, electroluminescence, solar cells, lasers, integrated optics, MEMS, etch resistance, hydrophobic / antistiction, blade edges, molds and dies, solid lubricants, anti corrosion, inside pores, nanotubes, around particles AFM tips, chemicals, catalysis, fuel cells, roll to roll, internal tube liners, nano-glue, biocompatible, and magnetics, among others; semiconductor wafer processing machines; deposition machines comprised in part of a reaction chamber, precursor lines, and a cabinet for coating;

SENSILEVER

EQUIPMENT AND INSTRUMENTS FOR MEASURING STATIC AND DYNAMIC PROPERTIES OF MICROMECHANICAL CANTILEVERS, NAMELY, CHEMICAL AND BIOCHEMICAL SENSORS FOR DETECTING TARGET SUBSTANCES IN GAS AND LIQUID, SPECIFICALLY RELATED TO THE DETECTION, MEASUREMENT, AND ANALYSIS OF VARIOUS SUBSTANCES IN PROXIMITY OF THE CANTILEVERS;

SHAPECONTROL

COMPUTER SOFTWARE FOR USE IN SCANNING AND MEASUREMENT OF WIDTH, DEPTH, PROFILE AND SHAPE;SHAPE CONTROL;

SIMPLY ALD

In the statement, Column 1, line 1 Limited Liability Company should be deleted and Corporation should be inserted.;Semiconductor wafer processing machines; atomic layer deposition machines for performing atomic deposition layering; deposition systems, comprised of a reaction chamber, precursor lines, and a cabinet, all sold as a unit, for use in applying atomic layer coatings on various surfaces;

SOLUS

manufacturing process equipment machines for applying vacuum coatings onto items from ion sources and related machine parts therefore;

SOURCERER

Computer control software for use in Ion Beam System applications through touch screen mode;

SPECTOR

Optical coating ion beam machine for coating multi-layer optical thin films;

SPECTOR

Optical coating ion beam machine for coating multi-layer optical thin films;

SUMO

molecular beam epitaxy crucibles and effusion cells for manufacturing semi-conductors and integrated circuits;

TAHITI

Atomic layer deposition systems for a variety of coating applications, namely, gate dielectrics, gate electrodes, metal interconnects, diffusion barriers, DRAM, multilayer-capacitors, read heads, antireflection, optical filters, OLED layers, photonic crystals, transparent conductors, electroluminescence, solar cells, lasers, integrated optics, MEMS, etch resistance, hydrophobic / antistiction, blade edges, molds and dies, solid lubricants, anti corrosion, inside pores, nanotubes, around particles AFM tips, chemicals, catalysis, fuel cells, roll to roll, internal tube liners, nano-glue, biocompatible, and magnetics, among others; semiconductor wafer processing machines; deposition systems comprised in part of a reaction chamber, precursor lines, and a cabinet for coating;

TAPPINGMODE

feature of an atomic force microscope, namely, a probe tip;TAPPING MODE;MODE;

TITAN WAFER STEPPER

photolithography tool for imprinting integrated circuit designs on silicon wafers;WAFER STEPPER;

TRUHEAT

Heating wafer coil sold as a component part of Metal Organic Chemical Vapor Deposition (MOCVD) equipment;TRUE HEAT;

TURBODISC

heated high speed rotating disks operated under high vacuum and exposed to the flow of chemicals in the production of semiconductors;TURBO DISC;

TURBORAMP

Process control software for MOCVD equipment;TURBO RAMP;

ULTRATECH

educational services, namely, conducting training courses in the use of photolithographic machines for manufacturing semiconductor wafers and other substrates, reticles and masks for use with said photolithographic machines in manufacturing said semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates, and computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates;photolithographic machines for manufacturing semiconductor wafers and other substrates; reticles and masks for use with said photolithographic machines in manufacturing said semiconductor wafers and other substrates, wherein said reticles and masks contain the pattern to be printed on said semiconductor wafer and other substrates; specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates; computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates; and replacement parts and consumable materials for the aforesaid goods;operation, instruction and training manuals, and printed forms for use with photolithographic machines for manufacturing semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates, and computer software for use in operating photolithographic machines for manufacturing semiconductor wafers and other substrates;repair services for photolithographic machines for manufacturing semiconductor wafers and other substrates, specialized optical lenses, wafer, reticle and mask transport stages and wafer index tooling for use in manufacturing semiconductor wafers and other substrates;ULTRA-TECH;

ULTRATECH

Laser spike annealing systems comprised of lasers for annealing purposes, for use in the manufacture of transistors and other semiconductor devices;

UNIBLOCK

molecular beam epitaxy systems, namely a substrate holder for a molecular beam epitaxy growth chamber;

VEEBOT

Automatically Guided Utility Carts;

VEECO

THE DRAWING IS AMENDED TO APPEAR AS FOLLOWS: PUBLISH NEW CUT;[LEAK DETECTION AND] HIGH VACUUM APPARATUS [AND AUTOMATIC TEST AND PROCESS EQUIPMENT-NAMELY, GAUGES];

VEECO

[VACUUM GAUGING DEVICES, VALVES, PUMPS, CONTROLS;] ELECTRONIC SYSTEMS AND PARTS THEREFOR FOR HIGH VACUUM SYSTEMS, ULTRA-HIGH VACUUM SYSTEMS, [LEAK DETECTORS, GAS ANALYSIS, AND EVAPORATORS];

VEECO

[ Metrology devices and systems and parts thereof, namely, microscopes, surface profiling machines and parts thereof ];Manufacturing process equipment systems, namely semiconductor fabrication machines and magnetic storage fabrication machines, and parts thereof;

VEECO

The mark consists of the word Veeco wrapped by an open oval.;Manufacturing process equipment systems, namely, semiconductor fabrication machines and magnetic storage fabrication machines, and parts thereof;Color is not claimed as a feature of the mark.;