HIGH BRIGHTNESS

Brand Owner (click to sort) Address Description
EXSOLVE FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro OR 97124 high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy and mask repair; focused electron beam columns for electron beam lithography, electron beam microscopy, and liquid metal ion sources;
FEI FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro OR 97124 high brightness, submicron focused ion and electron beam systems using field emission technology; namely, for ion beam micromachining, ion milling, ion lithography, ion microscopes, secondary ion mass spectroscopy, electron microscopes and combined ion beam milling/electron microscope systems; high brightness, submicron ion and electron beam columns using field emission technology; namely, ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy, electron beam lithography, and electron beam microscopy; single crystal source materials; namely, refractory metals, LaB6 Mini-Vogel Mount cathodes, cold field emitters, Schottky emitters, and liquid metal ion sources;fei;
FEI FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro OR 97124 high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy, focused electron beam columns for electron beam lithography, and electron beam microscopy; single crystal source materials, namely, refractory metals, LaB6 mini-vogel cathodes, CeB6 mini-vogel mount cathodes, control grid electrodes, namely, rebuilt wehnelts; cold field emitters, schottky emitters, and liquid metal ion sources;COMPONENTS;
FEI BEAM TECHNOLOGY FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro OR 97124 HIGH BRIGHTNESS, SUBMICRON ION AND ELECTRON BEAM COLUMNS USING FIELD EMISSION TECHNOLOGY; NAMELY, FOCUSED ION BEAM COLUMNS FOR ION LITHOGRAPHY, ION BEAM MILLING, SECONDARY ION MASS SPECTROSCOPY, FOCUSED ELECTRON BEAM COLUMNS FOR ELECTRON BEAM LITHOGRAPHY, AND ELECTRON BEAM MICROSCOPY; SINGLE CRYSTAL SOURCE MATERIALS; NAMELY, REFRACTORY METALS, LaB6 MINI-VOGEL MOUNT CATHODES, CeB6 MINI-VOGEL MOUNT CATHODES, WEHNELT REBUILDING SERVICE, COLD FIELD EMITTERS, SCHOTTKY EMITTERS, AND LIQUID METAL ION SOURCES;BEAM TECHNOLOGY;
HELIOS HYDRA FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro OR 97124 high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy and mask repair; focused electron beam columns for electron beam lithography, electron beam microscopy, and liquid metal ion sources;
SCIOS FEI COMPANY 5350 NE Dawson Creek Drive Hillsboro OR 97124 high brightness, submicron ion and electron beam columns using field emission technology, namely, focused ion beam columns for ion lithography, ion beam milling, secondary ion mass spectroscopy and mask repair; focused electron beam columns for electron beam lithography, electron beam microscopy, and liquid metal ion sources;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A system provides an image displaying technique that provides stable high contrast even in an area having high brightness. Based on information about an average brightness level of a digital luminance signal, black-correction processing which decreases a brightness level by offsetting the brightness level to the minus side, and increase processing which increases a contrast gain within a dynamic range, are performed for an analog luminance signal or a digital luminance signal, enabling improvement in contrast even where brightness is intense.