PLASMA GENERATOR ETCHING BYPRODUCT

Brand	Owner	Address	Description
CLEANLINE	MKS INSTRUMENTS, INC.	2 Tech Drive, Suite 201 Andover MA 01810	Plasma generator for etching byproduct from vacuum piping, components, and systems;CLEAN LINE;
	Where the owner name is not linked, that owner no longer owns the brand

Technical Examples

An apparatus and method are described for etching Ni-containing films using gas phase plasma etching. Etching of Ti-Ni alloys is carried out by exposure to plasma comprising hydrogen halide (HX) and carbonyl etching gases. The Ti in the Ti-Ni alloy is etched via an ion-assisted reaction with HX and the Ni is etched by reacting with CO. The method is particularly well suited for anisotropic etching of Ti-Ni metal gates for CMOS applications. Etching of Ni-Fe layers is carried out by exposure to plasma comprising a carbonyl etching gas.