MKS INSTRUMENTS, INC.

ASTEX

MICROWAVE PLASMA GENERATOR UNITS AND COMPONENT PARTS THEREFOR FOR USE IN INDUSTRIAL AND SCIENTIFIC APPLICATIONS;ASTECH;

ASTRON

plasma generators for etching, sputtering, chemical vapor deposition, ion implantation, ion milling, and sterilization;

AUTO-SOFT

AUTOMATIC VALVES;AUTOSOFT;

BARATRON

Capacitance Manometers for Measuring for Vacuum Pressure;

BARATRON M BAR

ELECTRONIC PROGRAMMER/DISPLAY INSTRUMENTS FOR CHARACTERIZING PRESSURE AND MASS FLOW;

CALIFLOW

APPARATUS FOR CALIBRATING FLOWMETERS;

CALSTAND

apparatus for calibrating pressure and flow transducers;calibrate stand;

CLEANLINE

Plasma generator for etching byproduct from vacuum piping, components, and systems;CLEAN LINE;

CLUSTERGUARD

residual gas analyzer and monitor;CLUSTER GUARD;

COMMUNICATORR

Vacuum Gauges;

CONDUCTRON

vacuum gauges, namely, gauge tubes and vacuum gauge controllers used in the measurement of vacuums;

CONVECTRON

vacuum gauges, namely gauge tubes and vacuum gauge controllers used in the measurement of vacuums;

CV

automatic compact vacuum valves for industrial vacuum systems;manually-operated metal compact vacuum valves for industrial vacuum systems;

DIP

Serial Gateways And High Density Input/Output Controllers;

DLI

electronically controlled apparatus for delivering liquid reactant materials to a process reactor for use in the field of semiconductor device processing;

EDGE

Radio Frequency (RF) generators;

ETRAC

Radio Frequency (RF) matching networks;

GBROR

gas flow measuring device, namely, an in situ flow verifier of process or purge gases;

HPS

APPARATUS COMPONENTS FOR MATERIALS PROCESSING, NAMELY GAUGE SYSTEMS, GAUGES, TRANSDUCERS, AUTOMATIC VALVES;APPARATUS COMPONENTS FOR MATERIALS PROCESSING, NAMELY METAL FLANGES, METAL FITTINGS FOR GAS LINES;APPARATUS COMPONENTS FOR MATERIALS PROCESSING, NAMELY, HEATED LINES AND TRAPS;

I-MAG

cold cathode high vacuum gauge;

LIQUOZON

ozone generators;LIQUID OZONE;

M K S

Sensors and Electrical Instrumentation and Power Supplies and Signal Conditioners and Analog and Digital Meters for Measurement and Control of Fluid Pressure, Vacuum and Flow;MKS;

MASS-FLO

instruments for measuring and controlling the flow of gases and vapors;mass flow;

MATRIX

RF power supplies and generators for semiconductors, flat panel displays, data storage and MEM markets;

MICRO-ION

vacuum gauges, namely, gauge tubes and vacuum gauge controllers used in the measurement of vacuums;

MICROCAL

PC operated equipment for calibrating flow meters using software controlled thermal mass flow controllers;

MINI-CONVECTRON

Vacuum Gauges, namely Gauge Tubes and Vacuum Gauge Controllers used in the measurement of Vacuums;MINI CONVECTRON;

MKS

Sensors and Electrical Instrumentation and Power Supplies and Signal Conditioners and Analog and Digital Meters for Measurement and Control of Fluid Pressure, Vacuum and Flow;No claim is made to the exclusive right to use MKS, apart from the mark as shown.;

MKS

Sensors, electrical instrumentation, gauges, switches and meters for measurement and control of fluid pressure, vacuum and gas flow; residual gas analyzers; monitors for detecting gas compositions within a process chamber; mass spectrometers; electrical analog-digital interface adapters; computer hardware used for measurement and control of fluid pressure, vacuum and gas flow; radio frequency, direct current and microwave power supplies and generators; power generators for converting energy from chemical gas reactions; gas and fluid pressure valves, flanges and fittings for controlling, containing, isolating and shutting off gas and fluid flow; gas sticks composed of mass flow controllers, pressure transducers, control valves, isolation valves and volumes; electronic gas filters and purifiers; heaters; helium leak detectors; gas detectors and analyzers; calibration equipment for monitoring and adjusting gas and fluid pressure and flow; traps for capturing waste materials exiting from a process chamber; liquid delivery system composed primarily of a pump, vaporizer, and controller for vaporizing a liquid into a gas and delivering the gas to a process chamber; software for operating mass spectrometers; computer hardware and software for determining the presence and measurement of residual contaminants; micro-processor based data communication devices for communicating between quadrapole gas or fluid mass analyzers for and a computer; devices used to generate radio waves and microwave plasma; reactive gas generators including remote plasma sources and ozone generators; controllers, computer hardware and software for use in monitoring and controlling fluid, vacuum and gas generation, flow, detection, analysis, and delivery devices; radio frequency amplifiers and radio frequency power generators; DC power generators; and user manuals and guides sold as a unit therewith;

MKS

INDUSTRIAL PROGRAMMABLE COMPUTER HARDWARE; PLASMA GENERATORS; DISSOLVED GAS GENERATION AND DELIVERY SYSTEMS; ELECTRONIC CONTROL EQUIPMENT, namely, MICROPROCESSOR BASED DATA COMMUNICATION DEVICES AND DATA ANALYTICS DEVICES;

MKS

FIBER OPTIC TEMPERATURE SENSORS; OPTICAL AMPLIFIERS; TEMPERATURE SENSORS; FIBER OPTIC TEMPERATURE SENSORS USING FIBER BRAGG GRATINGS; FIBER OPTIC POSITION SENSORS;SEMICONDUCTOR WAFER PROCESSING EQUIPMENT;ENGINEERING, DESIGN AND DISTRIBUTION OF MEASUREMENT TECHNOLOGY IN THE FIELD OF SEMICONDUCTOR INDUSTRIES; RESEARCH IN THE AREA OF SEMICONDUCTOR PROCESSING TECHNOLOGY; TECHNICAL CONSULTANCY IN RELATION TO METHODS AND DEVICES IN THE FIELD OF SEMICONDUCTOR PROCESSING TECHNOLOGY;

MKS BARATRON

THE LETTERS MKS ARE DISCLAIMED APART FROM THE MARK AS SHOWN.;ELECTRICALLY ACTUATED PRESSURE METER ADAPTED FOR PRESSURE SENSING, MEASURING AND RECORDING;

MKS INSTRUMENTS, INC.

SENSORS AND ELECTRICAL INSTRUMENTATION AND POWER SUPPLIES AND SIGNAL CONDITIONERS AND ANALOG AND DIGITAL METERS FOR MEASUREMENT AND CONTROL OF FLUID PRESSURE, VACUUM AND FLOW;AS TO THE LETTERS MKS;INSTRUMENTS, INC.;

MKS NEWPORT

The mark consists of the letters mks, in lower case and the word Newport, divided by a vertical line, with three dots, arranged in a left-facing ninety degree angle, appearing before the letters mks.;measuring, testing and laboratory equipment in the fields of optics and photonics, namely, mirrors, lenses, beamsplitters, optical filters, polarizers, waveplates, prisms, pinholes, attenuators, beam expanders, collimators, retroreflectors, windows, optical sensors, optical power and energy meters, optical integrating spheres, optical mounts, optical pedestals, optical posts, post collars, post bases, post clamps, post platforms, mounting platforms, tilt platforms, positioning bases, optical rails, optical rail systems, beam routing systems, damped rods, laboratory jacks, optical tables, optical workstations, optical breadboards, vibration isolated workstations, vibration damped workstations, vibration isolators, vibration dampers, optical micro-fabrication workstations, spectrometers, optical fibers, cables and fiber bundles, optical fiber shears, optical fiber cleavers, optical fiber couplers, optical fiber adaptors, optical fiber strippers, optical fiber microscopes, lasers not for medical use, laser diodes, laser diode drivers, laser diode controllers, laser diode mounts, tunable light sources, translation stages, linear stages, vertical stages, rotary stages, goniometric stages, manual positioning actuators, motorized positioning actuators, piezo actuators and controllers, threaded actuators, hexapod positioners, motion controllers, ceramic air-bearing stages, and integrated multi-axis motion control systems;Color is not claimed as a feature of the mark.;