SCANNING PROBE MICROSCOPES SEMICONDUCTOR

Brand Owner (click to sort) Address Description
PARK NANOSTANDARD PARK SYSTEMS CORP. 4F, Korea Advanced Nano Fab Center, 109, Gwanggyo-ro, Yeongtonggu, Suwon-si Gyeonggi-do 16229 Republic of Korea Scanning probe microscopes for semiconductor processing; scanning probe microscopes; magnetic measuring apparatus and instruments; electron microscopes; precision measuring apparatus; surface roughness testing machines and instruments; microscopes;PARK NANO STANDARD;
PARK SMARTANALYSIS PARK SYSTEMS CORP. 4F, Korea Advanced Nano Fab Center, 109, Gwanggyo-ro, Yeongtonggu, Suwon-si Gyeonggi-do 16229 Republic of Korea Scanning probe microscopes for semiconductor processing; scanning probe microscopes; magnetic measuring apparatus and instruments; electron microscopes; precision measuring apparatus; surface roughness testing machines and instruments; microscopes;PARK SMART ANALYSIS;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. The present invention discloses a front-wing cantilever for the conductive probe of electrical scanning probe microscopes, wherein two symmetrical front wings are installed to extend from two lateral sides of the front end of the cantilever so that those two front wings are positioned on two lateral sides of the conductive tip. The front-wing structure of the cantilever can effectively inhibit the optical perturbation in the electrical scanning probe microscopes and obviously promote the analysis accuracy thereof. The front-wing structure can provide the scanned region with an effective dark field lest the optical absorption appears in the scanned region of semiconductor specimen and inhibit the optical perturbation occurs during the measurement and analysis of the differential capacitance.