Brands and Their Owners
Welcome to the Brand page for “EAU-ZONE”, which is offered here for Chemical apparatus for the treatment of semiconductor wafers, semiconductor substrates and flat panel displays;chemical substances in aqueous- or vapour phase, comprising water, ozone and additives, or water and ozone, used for the removal of organic contamination, such as photoresist, photoresidues and dry etching residues on semiconductor substrates;chemical substances in aqueous- or vapour phase, comprising water, ozone and additives, or water and ozone, used for the formation of an oxide layer on semiconductor substrates;technical and scientific research and development in the field of chemical substances in aqueous- or vapour phase, containing water, ozone and additives, or water and ozone, and in the field of micro-electronics, for composing methods or designing equipment for the removal of organic contamination or for the formation of oxide layers on semiconductor wafers, semiconductor substrates and flat panel displays;.
Its status is currently believed to be active. Its class is unavailable. “EAU-ZONE” is believed to be currently owned by “IMEC VZW”.
Owner: |
IMEC VZW
Owner Details |
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Description: |
CHEMICAL APPARATUS FOR THE TREATMENT OF SEMICONDUCTOR WAFERS, SEMICONDUCTOR SUBSTRATES AND FLAT PANEL DISPLAYS;CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, COMPRISING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, USED FOR THE REMOVAL OF ORGANIC CONTAMINATION, SUCH AS PHOTORESIST, PHOTORESIDUES AND DRY ETCHING RESIDUES ON SEMICONDUCTOR SUBSTRATES;CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, COMPRISING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, USED FOR THE FORMATION OF AN OXIDE LAYER ON SEMICONDUCTOR SUBSTRATES;TECHNICAL AND SCIENTIFIC RESEARCH AND DEVELOPMENT IN THE FIELD OF CHEMICAL SUBSTANCES IN AQUEOUS- OR VAPOUR PHASE, CONTAINING WATER, OZONE AND ADDITIVES, OR WATER AND OZONE, AND IN THE FIELD OF MICRO-ELECTRONICS, FOR COMPOSING METHODS OR DESIGNING EQUIPMENT FOR THE REMOVAL OF ORGANIC CONTAMINATION OR FOR THE FORMATION OF OXIDE LAYERS ON SEMICONDUCTOR WAFERS, SEMICONDUCTOR SUBSTRATES AND FLAT PANEL DISPLAYS;
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Categories: | CHEMICAL APPARATUS TREATMENT |