LITEL INSTRUMENTS

ADVANCED SOURCE METROLOGY INSTRUMENT (ASMI)

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and pinhole cameras located either above or below the reticle plane with corresponding oversized openings in the reticle plane, the whole in the same form factor as a standard reticle for use in exposing photographically prepared patterns and images that are used for measuring and aiming to the surfaces of wafers for use in manufacturing of integrated circuits;Advanced Source Metrology Instrument;

ANALYSIS CHARACTERIZATION ENGINE (ACE)

Lithography analysis and simulation software;ANALYSIS CHARACTERIZATION ENGINE ACE;ANALYSIS CHARACTERIZATION ENGINE;

DISTORTION MAPPER (DMAP)

optical distortion mapping device comprised of computer software and reticle for determining distortion of a lithographic projection tool;Distortion Mapper;

HEIGHT MAPPER (ZMAP)

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an overlay metrology tool and overlay targets with corresponding half-shade plates located either above or below the reticle plane, the whole in the same form factor as a standard reticle for use in exposing images on wafers that are used for assessing and adjusting the focus of a lithographic stepper or step and scan tool;

HIGH ACCURACY IN-SITU INTERFEROMETER (HA-ISI)

Interferometer and software package for analyzing numerical bar-in-bar offset or shift data received from an overlay tool sold as a unit;High Accuracy In-Situ Interferometer;

HIGH ACCURACY INSPECSTEP INTERFEROMETER (HA-ISI)

Interferometer and software package for analyzing semiconductor chip optical test structure data received from an overlay tool, sold as a unit;HIGH ACCURACY INSPECTATION STEP INTERFEROMETER (HA-ISI);High Accuracy and Interferometer;

HIGH ACCURACY SOURCE METROLOGY INSTRUMENT (HA-SMI).

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and an in-situ imaging objective with mounting means attached to a framework in the same form factor as a standard reticle for use in exposing photographically prepared patterns and images that are used for measuring and aiming to the sufraces of wafers for use in manufacturing of integrated circuits;High Accuracy Source Metrology Instrument;

HYPER NA ISI

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an overlay metrology tool and lenses focused on openings in an aperture plate with an intervening patterned chrome face, in the same form factor as a standard reticle for use in exposing photographically prepared patterns in projection imaging systems that potentially operate at numerical apertures above one, and reconstructed lens aberrations that are used for sharpening the image at the surfaces of wafers for use in manufacturing of integrated circuits;HYPER NUMERICAL APERTURES ISI;

HYPER NA SMI

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and in-situ imaging objectives of the pinhole, refractive or reflective kind, in the same form factor as a standard reticle for use in exposing photographically prepared patterns on projection imaging systems that potentially operate at numerical apertures above one, and images that are used for measuring and aiming to the surfaces of wafers for use in manufacturing of integrated circuits;

IN-SITU INTERFEROMETER (ISI)

interferometer and a software package for analyzing data received from an overlay tool;In-Situ Interferometer;

INSPECSTEP INTERFEROMETER (ISI)

interferometer and a software package for analyzing data received from an overlay tool;INSPECT STEP INTERFEROMETER (ISI);Interferometer;

LITEL INSTRUMENTS

scientific apparatus; namely, optics-based devices for sensing and materials processing and related optical components therefor, and acoustic-based devices for sensing and materials processing and related acoustic components therefor;INSTRUMENTS;

LITEL INSTRUMENTS

INSTRUMENTS;engineering services related to optics and acoustics for sensing and materials processing;

LITEL INSTRUMENTS

Litel Instruments is a privately held company based in San Diego, California USA; Litel is dedicated to adding value to the semiconductor photolithography community by providing innovative, easy to use and inexpensive products that improve the performance and yield of photolithography tools;

LUMENA

optical metrology product that provides an accurate measurement of the Numerical Aperture of a lithography tool and variation of same across the stepper or scanner exposure field, by utilizing an instrument that fits in a standard reticle/pellicle envelope, and a software package that processes the wafer images;

POLARIZATION MAPPER (PMAP)

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and combined in-situ imaging objectives and multiple polarizing elements for use in exposing photographically prepared patterns and images that are used for measuring and adjusting projection imaging systems used in the manufacture of integrated circuits;

PREDICTIVE LITHOGRAPHY

combination of lithographic exposure tool diagnostics and mathematical techniques to predict a priori the feature printed;

PREDICTIVELITHOGRAPHY

An emulator for semiconductor lithographic projection tools (steppers and scanners) that combines precise characterization of the tool using in-situ hardware and a computer simulation program utilizing above characterizations;PREDICTIVE LITHOGRAPHY;

SOURCE METROLOGY INSTRUMENT (SMI)

Components of optical instruments for use in the semiconductor industry, namely, apparatus comprised of computer software for use in analyzing data received from an image capture tool and in-situ imaging objectives of the pinhole, refractive or reflective kind, in the same form factor as a standard reticle for use in exposing photographically prepared patterns and images that are used for measuring and aiming to the surfaces of wafers for use in manufacturing of integrated circuits;Source Metrology Instrument;

TRANSMISSION MAPPER (TMAP)

Combination of a software package and a specialized reticle for use in determining the state of the lens angular transmittance of an optical projection system;

USE THE STANDARD

metrology tools for characterizing the properties of illumination sources of photolithography steppers and step-and-scan apparatus for semiconductors; interferometers for fabricating semiconductors;