METROLOGY INSTRUMENTS

Brand Owner (click to sort) Address Description
ELLONA ELLONA 3 avenue Didier Daurat F-31400 TOULOUSE France Metrology instruments; apparatus for analyzing gases, light, humidity, liquids, fluids, noise, air; altimeters; aerometers; anemometers; barometers; hygrometers; sound locating instruments; heat regulating apparatus; flow meter; detectors and sensors for gas, light, humidity, liquids, noise, air; breath detectors; indicators for gas, light, humidity, liquids, noise, air; none of the aforesaid goods relating to electric household or kitchen appliances, white goods or consumer electronics;Thermal-conversion solar collectors; heating apparatus for solid, liquid or gaseous fuels; hot water heating installations; air deodorizing apparatus; none of the aforesaid goods relating to electric household or kitchen appliances, white goods or consumer electronics;Health counseling;Scientific and technological services as well as research and design services relating thereto; industrial analysis and research services; scientific and industrial research services in the field of metrology and well-being; gas, light, humidity, liquid, fluid, noise and air analysis; surveying [engineering work]; metrological information services; advice related to energy saving; none of the aforesaid services relating to electric household or kitchen appliances, white goods or consumer electronics;
FASTFORCE VOLUME Bruker Nano, Inc. 112 Robin Hill Road Santa Barbara CA 93117 Metrology instruments, namely, scanning probe microscopes (SPMs) and atomic force microscopes (AFMs);FAST FORCE VOLUME;VOLUME;
XE-3DM PARK SYSTEMS CORP. 4F, Korea Advanced Nano Fab Center, 109, Gwanggyo-ro, Yeongtonggu, Suwon-si Gyeonggi-do 16229 Republic of Korea metrology instruments, namely, scanning probe microscopes and atomic force microscopes;XE-THREE DM;
 

Where the owner name is not linked, that owner no longer owns the brand

    
Technical Examples
  1. A method of generating a metrology recipe includes identifying regions of interest within a device layout. A coordinate list, which corresponds to the identified regions of interest, can be provided and used to create a clipped layout, which can be represented by a clipped layout data file. The clipped layout data file and corresponding coordinate list can be provided and converted into a metrology recipe for guiding one or more metrology instruments in testing a processed wafer and/or reticle. The experimental metrology results received in response to the metrology request can be linked to corresponding design data and simulation data and stored in a queriable database system.