Tegal Corporation

901G

SEMICONDUCTOR MANUFACTURING MACHINE CONSISTING OF AN ETCHING CHAMBER, GAS HANDLING UNITS, RF GENERATORS, ELECTRICAL POWER SUPPLY, DIGITAL CONTROLLERS, AND CIRCUIT BOARDS AND RELATED COMPUTER SOFTWARE FOR CLEANING, ETCHING AND TREATMENT APPLICATIONS;

903G

SEMICONDUCTOR MANUFACTURING MACHINE CONSISTING OF AN ETCHING CHAMBER, GAS HANDLING UNITS, RF GENERATORS, ELECTRICAL POWER SUPPLY, DIGITAL CONTROLLERS, AND CIRCUIT BOARDS AND RELATED COMPUTER SOFTWARE FOR CLEANING, ETCHING AND TREATMENT APPLICATIONS;

980

SEMICONDUCTOR MANUFACTURING MACHINE CONSISTING OF AN ETCHING CHAMBER, GAS HANDLING UNITS, RF GENERATORS, ELECTRICAL POWER SUPPLY, DIGITAL CONTROLLER, AND CIRCUIT BOARDS AND RELATED COMPUTER SOFTWARE FOR CLEANING, ETCHING AND TREATMENT APPLICATIONS;

981

SEMICONDUCTOR MANUFACTURING MACHINE CONSISTING OF AN ETCHING CHAMBER, GAS HANDLING UNIT, RF GENERATOR, ELECTRICAL POWER SUPPLY, DIGITAL CONTROLLER, AND CIRCUIT BOARDS AND RELATED COMPUTER SOFTWARE FOR CLEANING, ETCHING AND TREATMENT APPLICATIONS;

983

SEMICONDUCTOR MANUFACTURING MACHINE CONSISTING OF AN ETCHING CHAMBER, GAS HANDLING UNITS, RF GENERATOR, ELECTRICAL POWER SUPPLY, DIGITAL CONTROLLER, AND CIRCUIT BOARDS AND RELATED COMPUTER SOFTWARE FOR CLEANING, ETCHING AND TREATMENT APPLICATIONS;

HRE-

high density reflected electron plasma reactor used to etch materials for the manufacture of semiconductor devices;

I901

Semiconductor manufacturing machine consisting of an etching chamber, gas handling unit, RF generator, electrical power supply, digital controller, and circuit boards and related computer software for cleaning, etching and treatment applications;

I903

SEMICONDUCTOR MANUFACTURING MACHINE CONSISTING OF AN ETCHING CHAMBER, GAS HANDLING UNITS, RF GENERATORS, ELECTRICAL POWER SUPPLY, DIGITAL CONTROLLERS, AND CIRCUIT BOARDS AND RELATED COMPUTER SOFTWARE FOR CLEANING, ETCHING AND TREATMENT APPLICATIONS;

NLD

Semiconductor wafer processing machines;

NOVOL

SEMICONDUCTOR PROCESSING TOOLS, NAMELY, ETCHING TOOLS FOR USE IN ETCHING NON-VOLATILE AND LOW VOLATILITY MATERIALS AND FILMS, SUCH AS PLATINUM, IRIDIUM, IRIDIUM OXIDE, BARIUM STRONTIUM TITANATE (BST), STRONTIUM BISMUTH TITANATE (SBT), STRONTIUM TITANATE (STO), RUTHENIUM, RUTHENIUM OXIDE, LEAD ZIRCONIUM TITANATE (PZT), IRON, NICKEL, AND COPPER FILMS, IN THE FORMATION OF SEMICONDUCTOR DEVICES; COMPUTER HARDWARE USED WITH SEMICONDUCTOR PROCESSING TOOLS, AND SOFTWARE USED TO CONTROL THE SEMICONDUCTOR PROCESSING TOOLS;

ONCORE

Semiconductor manufacturing machines;ON CORE;

PLASMALINE

Plasma Reactor for Cleaning, Etching, and Treating Semiconductor Wafers in a Radio-Frequency-Induced Plasma;

PLASMOD